Spin Coater 401

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$2,399.00

Last updated on March 17, 2018 10:48 pm
Category:
PictureSpin Coater
Description– The machine also called spin coating photoresist spin coating machine, rotating machine, rotary coating machine, coating machine, rotary machine, vacuum coating machine;

Spin Coater(KW-4A) is suitable for the technology of microelectronics, semiconductor, plate making, new energy, biological materials, thin film, optical and surface coating and so on. The Spin Coater is mainly used in the sol-gel (sol-gel) experiments in the film production, the principle is the high-speed rotating substrate. And the gel drop on the substrate will be evenly coated via centrifugal force. Its thickness is not only depended on the gel liquid and the viscosity Coefficient between gel liquid and substrate, but also with the rotation speed and time

Features1.The characteristics of the spin coater are dual rotational speed Spin coater. Two speeds and filming time can be continuously controlled. it starts to rotate by low speed and after a few seconds it automatically switches to high speed.
Ⅰstage: Range of speed: 500-2000 rpm/min    filming time:2-18 seconds
Ⅱstage: Range of speed: 1300-8000 rpm/min    filming time:3-60 seconds
2.LED digital display; Speed stability: ±1%, Uniformity of gel: ±3%
3.Supply voltage: 220V/50Hz
4.Power: 40w
5.Application: Φ5-Φ100mm filming for silicon chip and other materials.( Equipped with various types of pallets to purchase or free special customized)
6.Vacuum pumping rate: ≥60L/S
7.The product is small size, light in weight, easy to operate maintenance.Mai structure Dimension: :210×220×160mm(8.3in×8.7in×6.3in)Note: the spin coater need to equipped with vacuum pump (recommended to use of a double stage free oil vacuum pump model SK-65C)

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